50mm*0.3 Polycrystalline Optical Grade CVD Diamond Window Diamond Wafer
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Product Highlights
- Extreme Hardness: Mohs hardness 10 ensures outstanding scratch resistance and durability.
- Large Size Customization: Diameter up to 200 mm and thickness 0.5-3.0 mm are customizable.
- High Surface Quality: Surface roughness <15 nm with parallelism <5 arcmin for precision stability.
- OEM/ODM Customization: Accepts custom orders based on drawings with various sizes, thicknesses, and coatings.
- High Purity MPCVD Process: Produced via Microwave Plasma CVD ensuring low defect density and batch consistency.
Product Attributes
- Customization
- Available
- Color
- White
- Hardness
- 10
- Process Type
- CVD
- Material
- Diamond
- Usage
- Optical ,Electronic,Seeds
- Transport Package
- Plastic Bottle
- Specification
- 1-14mm
- Trademark
- chenguang
- Origin
- Hunan, China
- HS Code
- 71049019
- Production Capacity
- 5000 PCS/Month
Shipping
- Shipping Cost:
- Contact the supplier about freight and estimated delivery time.
Online Trading Protection
- Payment Guarantee
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Platform-protected payments with refund support for eligible order issues.
- Platform Logistics
- Clearer shipment tracking with platform-supported logistics.
- Inspection Service
- Optional pre-shipment inspection for quality and quantity checks.
- After-Sales & Dispute Handling
- Platform-assisted dispute resolution, including refunds or returns when applicable.
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Product Description
Product Description
Leveraging state of the art CVD diamond growth and precision polishing technologies, we offer high performance, large area polycrystalline optical grade diamond products. As a reliable supplier for optical and thermal management applications, we are committed to providing large size, high quality optical components and heat spreader substrates.
Manufacturing Process
Our polycrystalline optical grade diamond is produced by Microwave Plasma Chemical Vapor Deposition (MPCVD). High purity methane and hydrogen gases are activated by microwave plasma, allowing diamond nucleation and uniform growth on a substrate. The asgrown diamond film is then laser cut, precisely ground, and polished to achieve optical grade surface quality and tight dimensional tolerances. This process ensures low defect density, high purity, and excellent batchtobatch consistency.
Key Features & Selling Points
Ultra Wide Optical Transmission Band
Excellent transmittance from deep ultraviolet (UV) to far infrared (FIR) and even microwave bands. Spectral coverage: 220 nm to >50 µm.
Superior Thermal Management
Thermal conductivity > 2200 W/m·K at room temperature. Under high heat flux conditions (up to 350 W/cm² or higher) for high power lasers and semiconductor laser bars, it rapidly dissipates heat, ensuring device reliability and performance.
Extreme Hardness & Durability
Mohs hardness 10, outstanding scratch resistance and chemical inertness. Suitable for harsh industrial and medical environments.
Large Size Customization Capability
Diameter up to 5 200 mm (customizable), thickness 0.5 3.0 mm (customizable). Meets the requirements of large size core optical components such as EUV lithography and high power microwave windows.
Low Absorption & Low Scatter
Extremely low bulk absorption and scattering loss at 1064 nm and 10.6 µm, preserving the beam quality of high power lasers.
High Surface Quality Tolerance
Surface quality: 40 20 scratchdig. Parallelism <5 arcmin. Surface roughness <15 nm over 1 mm². Ensures high precision and stability of optical systems.
Specifications
| Parameter | Value |
|---|---|
| Material Form | Window, wafer, plate, custom geometry (OEM drawing) |
| Typical Dimensions | Ø5 mm - Ø200 mm, or square/custom shapes |
| Thickness | 0.3 mm - 3.0 mm (precise control & customization) |
| Optical Transmission Range | 220 nm - >50 µm |
| Thermal Conductivity | 1200 - 2200+ W/m·K @ 300 K |
| CTE (Coefficient of Thermal Expansion) | 1.0 ppm/K @ 300 K |
| Refractive Index | 2.38 @ 10.6 µm |
| Bulk Absorption Coefficient | <0.07 cm-¹ @ 10.6 µm; <1 cm-¹ @ 1 µm |
| Young's Modulus | 1050 GPa |
| Hardness | Mohs 10 / 81 ± 18 GPa |
| Purity / Quality Grade | Optical Grade |
| Deposition Process | MPCVD (Microwave Plasma CVD) |
Applications
High Power Lasers - Output windows for high power CO2 lasers; output couplers for high power solid state and fiber lasers. Withstands extreme power densities, effectively cools the window and prevents thermal lensing.
EUV Lithography Systems - Critical optical components for advanced semiconductor node manufacturing.
Microwave Engineering & Terahertz Technology - Microwave windows, THz beam splitters, THz lenses, and THz vacuum windows.
High End Heat Spreaders - Substrates or heat sinks for high power semiconductor laser bars, GaN RF power amplifiers, high performance CPU/GPU chips. Rapidly spreads heat laterally from hot spots.
Optical Detection - Nuclear detectors, X ray windows, and other optical/protective windows in extreme environments.
Aerospace & Defense - Missile domes, aircraft optical windows, etc.
Quality Assurance & Customization Capabilities
All products undergo strict in process quality control and factory inspection. Test reports (spectral data, thermal conductivity, etc.) are available upon request. We accept OEM/ODM custom orders based on drawings, offering various sizes, thicknesses, and coating options (including anti reflection and high reflection coatings). For any special requirements, please contact our sales engineers.